Appendix C . Standards and References
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| Company |
Standard / Reference |
VLSI Standards
www.vlsi.com |
| Standards |
| |
Z=18nm, 44nm, 100nm, 180nm |
| |
Pitch=1.8μm, 3μm, 5μm ,10μm, 20μm |
| References: |
| |
Z=18nm, 44nm, 100nm, 180nm |
| |
Pitch=3μm,10μm |
|
MicroMasch
www.spmtips.com |
Pitch=3μm, 10μm
Z~1μm, 2μm |
Pacific Nanotechnology
www.pacificnanotech.com |
Pitch=20μm, 10μm, 5μm, 3μm
Z~75nm |
|
| XZ, YZ Orthogonality |
An AFM may be calibrated in XY and calibrated in Z and may not be
useful for making angular measurements. This is because the XZ and
YZ axis may not be orthogonal. With the orthogonality references, this
problem can be avoided. This reference is fabricated by making a 1-D array, or line, of triangles in a silicon wafer. |
| Company |
Standard / Reference |
MicroMasch
www.spmtips.com |
Pitch=3.0μm  5nm
Triangle edge curvature<10nm
Top angle=70deg |
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|
FIGURE C-2 This AFM
image of a triangle
pattern that is etched
in silicon is used for
measuring the cross
talk in the XZ and YZ
axis of the scanner.
Measurements from
the line profile show
that the angles are
55.16 and 55.59
degrees on the left and
the right side of one of
the triangular features. |
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