AFM University Introduction to Atomic Force Microscopy by Paul West

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Appendix C . Standards and References
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FIGURE C-1 This AFM image is of a single etched pattern of an AFM standard.The histogram at the right show the height of the feature is 16.62 nm.
Company Standard / Reference
VLSI Standards
www.vlsi.com
Standards
  Z=18nm, 44nm, 100nm, 180nm
  Pitch=1.8μm, 3μm, 5μm ,10μm, 20μm
References:
  Z=18nm, 44nm, 100nm, 180nm
  Pitch=3μm,10μm
MicroMasch
www.spmtips.com		 Z=20÷25nm, 90÷104nm, 496÷503nm, 1000nm, 15000nm
Pitch=3μm,10μm
HOPG all grades
SPI Supplies
www.2spi.com		 Pitch=300nm, 700nm
Z~100nm
Ted Pella
www.tedpella.com		 Pitch=0.463μm
Z~31nm
PacificNanotechnology
www.pacificnanotech.com		 Pitch=20μm, 10μm, 5μm, 3μm
Z~75nm
Electron Microscopy Science
www.emsdiasum.com		 Pitch=150nm, 300nm, 700nm
Z~100nm
NTT-AT
www.ntt-at.com		 AtomicStep=3.1nm
XY Linearity / Calibration / Orthogonality
Calibration of the AFM in the XY axis so that meaningful dimension measurements can be made requires establishing the linearity and orthoganality of the AFM scanner. This is typically done with etched patterns in quartz or silicon. Often the spedicimen that is used for calibrating the Z axis can be used for the XY axis as well.

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